Review on Micro- and Nanolithography Techniques and Their Applications

  • Alongkorn Pimpin Chulalongkorn University
  • Werayut Srituravanich Chulalongkorn University
Keywords: Nanolithography, photolithography, electron beam lithography, focused ion beam lithography, soft lithography, nanoimprint lithography, scanning probe lithography, dip-pen lithography, microsystems, MEMS, nanoscience, nanotechnology.

Abstract

This article reviews major micro- and nanolithography techniques and their applications from commercial micro devices to emerging applications in nanoscale science and engineering. Micro- and nanolithography has been the key technology in manufacturing of integrated circuits and microchips in the semiconductor industry. Such a technology is also sparking a magnificent transformation of nanotechnology. The lithography techniques including photolithography, electron beam lithography, focused ion beam lithography, soft lithography, nanoimprint lithography and scanning probe lithography are discussed. Furthermore, their applications are reviewed and summarized into four major areas: electronics and microsystems, medical and biotech, optics and photonics, and environment and energy harvesting.

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Author Biographies

Alongkorn Pimpin

Department of Mechanical Engineering, Faculty of Engineering, Chulalongkorn University, Bangkok 10330, Thailand

Werayut Srituravanich

Department of Mechanical Engineering, Faculty of Engineering, Chulalongkorn University, Bangkok 10330, Thailand

Published In
Vol 16 No 1, Nov 8, 2011
How to Cite
[1]
A. Pimpin and W. Srituravanich, “Review on Micro- and Nanolithography Techniques and Their Applications”, Eng. J., vol. 16, no. 1, pp. 37-56, Nov. 2011.